Influence of gas contaminant on the electron kinetic in microwave Ar plasmas at atmospheric pressure
نویسندگان
چکیده
Influence of nitrogen, oxygen and hydrogen traces in an atmospheric pressure argon surface-wave plasma was studied by mean of emission spectroscopy. The electron temperature and density were respectively shown to increase and decrease with an increased flow of gas contaminant, the trends being more significant in the case of oxygen. However, Ar 1s2 level number densities remained constant for all conditions. A power balance analysis also revealed that over the range of concentrations studied (traces ~0.1%), up to 90% of the absorbed power was consumed by the gas contaminant.
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